GaAs ManTech On-Line Digest Search

blue separation bar
The International Conference on
Compound Semiconductor Manufacturing Technology

"Sharing Ideas Throughout the Industry"

2010 On-line Digest Table of Contents

blue separation bar

Order everything you need with our convenient on-line order form
or contact Margaret Doyle at
mdoyle@gaasmantech.org

 
Click title for full PDF version of paper
Page Abstract
1.1 Page 3 Abstract
David C. Johnson, University of Oregon, Darren Johnson, University of Oregon, John F. Wager, Oregon State University and Douglas Keszler, Oregon State University
1.2 Page 7 Abstract
Steve Wolley, Avago Technologies
1.3 Page 13 Abstract
Cong Huang, Delft Institute of Microsystems and Nanoelectronics (DIMES), Koen Buisman, Delft Institute of Microsystems and Nanoelectronics (DIMES), Peter J. Zampardi, Skyworks Solutions, Lis K. Nanver, Delft Institute of Microsystems and Nanoelectronics (DIMES), Lawrence E. Larson, University of California, San Diego and Leo C. N. de Vreede, Delft Institute of Microsystems and Nanoelectronics (DIMES)
2.1 Page 21 Abstract
Y. Andoh, Navian, Inc.
2.2 Page 25 Abstract
Frank Juskey, TriQuint Semiconductor
2.3 Page 27 Abstract
Peter J. Zampardi, Skyworks Solutions
2.4 Page 28 Abstract
Ray Parkhurst, Avago Technologies
2.5 Page 29 Abstract
Frank Stewart, RF Micro Devices
3a.1. Page 33 Abstract
Bruce Bernhardt, Research in Motion
3a.2 Page 37 Abstract
Earl J. Lum, EJL Wireless
3b: Team Torture
3b.1  Page 43 Abstract
Bill Roesch, TriQuint Semiconductor, Leslie Marchut, RF Micro Devices, Bryan Shelton, Mimix Broadband, Alex Young, ANADIGICS, Steve Randle, Avago Technologies, Lance Rushing, Skyward Solutions and CS Bhasker, Skyward Solutions
4.1 Page 47 Abstract
Cheng-Guan Yuan, WIN Semiconductor, S. M. Joseph Liu, WIN Semiconductor, Clement Huang, WIN Semiconductor, Jiro Ho, WIN Semiconductor, Frank Chen, WIN Semiconductor, Chien-Liang Chan, WIN Semiconductor and Jung-Tao Chung, WIN Semiconductor
4.2 Page 51 Abstract
Partha Mukhopadhyay, Indian Institute of Technology - Kharagpur, Sudip Kundu, Indian Institute of Technology - Kharagpur, Palash Das, Indian Institute of Technology - Kharagpur, Saptarshi Pathak, Indian Institute of Technology - Kharagpur, Edward Y Chang, National Chiao Tung University and Dhrubes Biswas, Indian Institute of Technology - Kharagpur
4.3 Page 55 Abstract
Yufei Yang, Global Communication Semiconductors, Dave Rasbot, Global Communication Semiconductors, Chung-Hsu Chen, Global Communication Semiconductors, Bryan Lee, Global Communication Semiconductors, Wing Yau, Global Communication Semiconductors, Daniel Hou, Global Communication Semiconductors and Dave Wang, Global Communication Semiconductors
4.4 Page 59 Abstract
Cheng-Kuo Lin, WIN Semiconductor, Shu-Hsiao Tsai, WIN Semiconductor, Chao-Hong Chen, WIN Semiconductor, Ru-Yong Chen, WIN Semiconductor, Jen-Hao Huang, WIN Semiconductor and Yu-Chi Wang, WIN Semiconductor
5.1 Page 65 Abstract
Cristian Cismaru, Skyworks Solutions, Hal Banbrook, Skyworks Solutions and Peter J. Zampardi, Skyworks Solutions
5.2 Page 69 Abstract
Gergana I. Drandova, TriQuint Semiconductor and Kenneth D. Decker, TriQuint Semiconductor
5.3 Page 73 Abstract
Jason Gurganus, Cree, Inc., Terry Alcorn, Cree, Inc., Andy MacKenzie, Cree, Inc. and Zoltan Ring, Cree, Inc.
5.4 Page 77 Abstract
Robert Slater, TriQuint Semiconductor
6.1 Page 83 Abstract
Glenn Hafer, Skyworks Solutions
6.2 Page 87 Abstract
Nirav Thakker, Skyworks Solutions, Doug Beasley, Skyworks Solutions, Alma Lopez, Skyworks Solutions and Glenn Hafer, Skyworks Solutions
6.3 Page 91 Abstract
Robert Yanka, RF Micro Devices, Likang Li, RF Micro Devices and Andrew Shelton, RF Micro Devices
6.4 Page 95 Abstract
Mark Berry, Metryx, Inc., Liam Cunnane, Metryx, Inc., Adrian Kiermasz, Metryx, Inc. and Michael T. McClure, TriQuint Semiconductor
7.1 Page 101 Abstract
M. Hatano, University of Fukui, N. Kunishio, University of Fukui, H. Chikaoka, University of Fukui, J. Yamazaki, University of Fukui, Z. B. Makhzani, University of Fukui, N. Yafune, Japan R & D Center for Metal, Sharp Corp., K. Sakuno, Sharp Corp., S. Hashimoto, Sumitomo Electric Industries, K. Akita, Sumitomo Electric Industries, Y. Yamamoto, University of Fukui and M. Kuzuhara, University of Fukui
7.2 Page  105 Abstract
R. Schreiner, AIXTRON, A. Alam, AIXTRON, H. Protzmann, AIXTRON, B. Schineller, AIXTRON and M. Heuken, AIXTRON
7.3 Page 109 Abstract
Martin Kuball, University of Bristol, Nicole Killat, University of Bristol, Athikom Manoi, University of Bristol and James W. Pomeroy, University of Bristol
7.4 Page 111 Abstract
Sansaptak Dasgupta, University of California, Santa Barbara, Nidhi, University of California, Santa Barbara, David F. Brown, University of California, Santa Barbara, T. E. Mates, University of California, Santa Barbara, Stacia Keller, University of California, Santa Barbara, James S. Speck, University of California, Santa Barbara and Umesh K. Mishra, University of California, Santa Barbara
8.1 Page 117 Abstract
X. Zeng, Northrop Grumman Space Technology, P. Chang-Chien, Northrop Grumman Space Technology, K. Hennig, Northrop Grumman Space Technology, C. Chueng, Northrop Grumman Space Technology, T. Chung, Northrop Grumman Space Technology, G. Akerling, Northrop Grumman Space Technology, J. Gan, Northrop Grumman Space Technology, J. Uyeda, Northrop Grumman Space Technology, M. Barsky, Northrop Grumman Space Technology and A. Oki, Northrop Grumman Space Technology
8.2 Page 119 Abstract
Suzanne Combe, TriQuint Semiconductor and Elda Clarke, TriQuint Semiconductor
8.3 Page 123 Abstract
Erika Schutte, Skyworks Solutions, Heather Knoedler, Skyworks Solutions and Ernesto Ambrocio, Skyworks Solutions
8.4 Page 127 Abstract
Kezia Cheng, Skyworks Solutions, Minh Le, Skyworks Solutions, Donald Mitchell, Skyworks Solutions and Larry Hanes, Skyworks Solutions
8.5 Page 131 Abstract
Alan Bratschun, Avago Technologies and T. C. Tsai, WIN Semiconductor
9.1 Page 137 Abstract
P. Waltereit, Fraunhofer Institute - Freiburg, W. Bronner, Fraunhofer Institute - Freiburg, R. Kiefer, Fraunhofer Institute - Freiburg, R. Quay, Fraunhofer Institute - Freiburg, J. Kuehn, Fraunhofer Institute - Freiburg, F. van Raay, Fraunhofer Institute - Freiburg, M. Dammann, Fraunhofer Institute - Freiburg, S. Mueller, Fraunhofer Institute - Freiburg, C. Libal, Fraunhofer Institute - Freiburg, T. Meier, Fraunhofer Institute - Freiburg, M. Mikulla, Fraunhofer Institute - Freiburg and O. Ambacher, Fraunhofer Institute - Freiburg
9.2 Page 141 Abstract
P. Kurpas, Ferdinand Braun Institut fuer Hoechstfrequenztechnik, I. Selvanathan, Ferdinand Braun Institut fuer Hoechstfrequenztechnik, M. Schultz, Ferdinand Braun Institut fuer Hoechstfrequenztechnik, H. Sahin, United Monolithic Semiconductors, P. Ivo, Ferdinand Braun Institut fuer Hoechstfrequenztechnik, M. Matalla, Ferdinand Braun Institut fuer Hoechstfrequenztechnik, J. Splettstoesser, United Monolithic Semiconductors, A. Barnes, ESA/ESTEC and J. Wuerfl, Ferdinand Braun Institut fuer Hoechstfrequenztechnik
9.3 Page 145 Abstract
Hongwei Chen, Hong Kong University of Science and Technology, Maojun Wang, Hong Kong University of Science and Technology and Kevin J. Chen, Hong Kong University of Science and Technology
9.4 Page 149 Abstract
H. P. Xin, Northrop Grumman Space Technology, S. Poust, Northrop Grumman Space Technology, W. Sutton, Northrop Grumman Space Technology, D. Li, Northrop Grumman Space Technology, D. Lam, Northrop Grumman Space Technology, I. Smorchkova, Northrop Grumman Space Technology, R. Sandhu, Northrop Grumman Space Technology, B. Heying, Northrop Grumman Space Technology, J. Uyeda, Northrop Grumman Space Technology, M. Barsky, Northrop Grumman Space Technology, M. Wojtowicz, Northrop Grumman Space Technology and R. Lai, Northrop Grumman Space Technology
9.5 Page 153 Abstract
Reza Behtash, United Monolithic Semiconductors, James R. Thorpe, United Monolithic Semiconductors, S. Held, United Monolithic Semiconductors, Dominik Schrade-Koehn, University of Ulm and Herve Blanck, United Monolithic Semiconductors
10.1 Page 159 Abstract
David Crawford, Skyworks Solutions, Yelda Rescei, Skyworks Solutions, Manjeet Singh, Skyworks Solutions, Dragana Barone, Skyworks Solutions, Samuel Mony, Skyworks Solutions and Shiban Tiku, Skyworks Solutions
10.2 Page 163 Abstract
A. J. Stoltz, US Army REDCOM, J. D. Benson, US Army REDCOM and P. J. Smith, US Army REDCOM
10.3 Page 167 Abstract
D. Johnson, Plasma-Therm, D. Geerpuram, Plasma-Therm, C. Johnson, Plasma-Therm, L. Martinez, Plasma-Therm and J. Plumhoff, Plasma-Therm
10.4 Page 171 Abstract
J. Crites, Cobham DES, J. Dilley, Cobham DES, S. Kittenger, Cobham DES, W. Pickens, Cobham DES, W. Polhamus, Cobham DES, M. Balzan, Cobham DES and M. Drinkwine, Cobham DES
10.5 Page 175 Abstract
A. J. Grine, Sandia National Laboratory, J. B. Clevenger, Sandia National Laboratory, M. J. Martinez, Sandia National Laboratory, F. H. Austin, LMATA, P. S. Vigil, LMATA, K. L. Romero, LMATA, R. Timon, Sandia National Laboratory, G. A. Patrizi, Sandia National Laboratory and C. T. Sullivan, Sandia National Laboratory
11.1 Page 181 Abstract
J. K. Gillespie, Air Force Research Lab, A. Crespo, Air Force Research Lab, K. Chabak, Air Force Research Lab, M. Kossler, Air Force Research Lab, V. Trimble, Air Force Research Lab, M. Trejo, Air Force Research Lab, G. D. Via, Air Force Research Lab, B. Winningham, Air Force Research Lab, B. Poling, Wyle Labs and D. Walker, Jr., Wyle Labs
11.2 Page 185 Abstract
Han Wang, Massachusetts Institute of Technology, Jinwook W. Chung, Massachusetts Institute of Technology, Xiang Gao, IQE RF, Shiping Guo, IQE RF and Tomas Palacios, Massachusetts Institute of Technology
11.3 Page 189 Abstract
Man Hoi Wong, University of California, Santa Barbara, Yi Pei, University of California, Santa Barbara, David F. Brown, University of California, Santa Barbara, James S. Speck, University of California, Santa Barbara, Umesh K. Mishra, University of California, Santa Barbara, Michael Schuette, Ohio State University, Hyeongnam Kim, Ohio State University, Venkatesh Balasubramanian, Ohio State University and Wu Lu, Ohio State University
11.4 Page 193 Abstract
Chuanxin Lian, University of Notre Dame, Yu Cao, University of Notre Dame, Ronghua Wang, University of Notre Dame, Guowang Li, University of Notre Dame, Tom Zimmermann, University of Notre Dame, Debdeep Jena, University of Notre Dame and Huili Xing, University of Notre Dame
11.5 Page 197 Abstract
T. J. Anderson, Naval Research Laboratory, M. J. Tadjer, University of Maryland, M. A. Mastro, Naval Research Laboratory, J. K. Hite, Naval Research Laboratory, K. D. Hobart, Naval Research Laboratory, C. R. Eddy, Jr., Naval Research Laboratory and F. J. Kub, Naval Research Laboratory
12.1 Page 203 Abstract
Suman Datta, Pennsylvania State University, S. Mookerjea, Pennsylvania State University, D. Mohata, Pennsylvania State University, L. Liu, Pennsylvania State University, V. Saripalli, Pennsylvania State University, V. Narayanan, Pennsylvania State University and T. Mayer, Pennsylvania State University
12.2 Page 207 Abstract
Xiu Xing, University of Notre Dame and Patrick J. Fay, University of Notre Dame
12.3 Page 211 Abstract
Yi-Che Lee, Georgia Institute of Technology, Hee-Jin Kim, Georgia Institute of Technology, Yun Zhang, Georgia Institute of Technology, Suk Choi, Georgia Institute of Technology, Russell D. Dupuis, Georgia Institute of Technology, Jae-Hyun Ryou, Georgia Institute of Technology and Shyh-Chiang Shen, Georgia Institute of Technology
12.4 Page 215 Abstract
Yasufumi Fujiwara, Osaka University, Atsushi Nishikawa, Osaka University and Yoshikazu Terai, Osaka University
13.1 Page 221 Abstract
Michael Briere, ACCO Enterprises
13.2 Page 225 Abstract
M. Germain, IMEC, J. Derluyn, IMEC, M. Van Hove, IMEC, F. Medjdoub, IMEC, J. Das, IMEC, D. Marcon, IMEC, S. Degroote, IMEC, K. Cheng, IMEC, M. Leys, IMEC, D. Visalli, IMEC, P. Srivastava, IMEC, K. Geens, IMEC, J. Viaene, IMEC, B. Sijmus, IMEC, S. Decoutere, IMEC and G. Borghs, IMEC
13.3 Page 229 Abstract
Ogyun Seok, Seoul National University, Young-Hwan Choi, Seoul National University, Minki Kim, Seoul National University, Jumi Kim, Sungkyunkwan University, Byungyou Hong, Sungkyunkwan University and Min-Koo Han, Seoul National University
13.4 Page 233 Abstract
Chunhua Zhou, Hong Kong University of Science and Technology, Wanjun Chen, Hong Kong University of Science and Technology, Edwin L. Piner, Nitronex Corp. and Kevin J. Chen, Hong Kong University of Science and Technology
13.5 Page 237 Abstract
Minki Kim, Seoul National University, Young-Hwan Choi, Seoul National University, Jiyong Lim, Seoul National University, Young-Shil Kim, Seoul National University, Ogyun Seok, Seoul National University and Min-Koo Han, Seoul National University
14.1 Page 243 Abstract
Fang Liu, University of California, Berkeley and Roya Maboudian, University of California, Berkeley
14.2 Page 245 Abstract
Chris Constantine, Oerlikon Solar
14.3 Page 247 Abstract
Chao-Hsin Wu, University of Illinois, Gabriel Walter, University of Illinois, Han Wui Then, University of Illinois and Milton Feng, University of Illinois
14.4 Page 251 Abstract
Liang-Yi Chen, National Taiwan University, Ying-Yuan Huang, National Taiwan University, Chun-Siang Chang, National Taiwan University and Jian-Jang Huang, National Taiwan University
15.1 Page 257 Abstract
Naoya Okamoto, Fujitsu and Fujitsu Laboratories, Toshihiro Ohki, Fujitsu and Fujitsu Laboratories, Kozo Makiyama, Fujitsu and Fujitsu Laboratories, Atsushi Yamada, Fujitsu and Fujitsu Laboratories, Satoshi Masuda, Fujitsu and Fujitsu Laboratories, Masahito Kanamura, Fujitsu and Fujitsu Laboratories, Yoichi Kamada, Fujitsu and Fujitsu Laboratories, Kenji Imanishi, Fujitsu and Fujitsu Laboratories, Hisao Shigematsu, Fujitsu and Fujitsu Laboratories, Toshihide Kikkawa, Fujitsu and Fujitsu Laboratories, Kazukiyo Joshin, Fujitsu and Fujitsu Laboratories and Naoki Hara, Fujitsu and Fujitsu Laboratories
15.2 Page 261 Abstract
H. Stieglauer, United Monolithic Semiconductors, J. Noesser, United Monolithic Semiconductors, A. Miller, United Monolithic Semiconductors, M. Lanz, United Monolithic Semiconductors, D. Oettlin, United Monolithic Semiconductors, G. Jonson, United Monolithic Semiconductors, D. Behammer, United Monolithic Semiconductors, C. Landesberger, Fraunhofer Institute - Munich, H.-P. Spoehrle, Fraunhofer Institute - Munich and K. Bock, Fraunhofer Institute - Munich
15.3 Page 267 Abstract
Ju-Ai Ruan, TriQuint Semiconductor, Sam Roadman, TriQuint Semiconductor and Wade Skelton, TriQuint Semiconductor
15.4 Page 271 Abstract
Koichiro Nishizawa, Mitsubishi Electric, Katsuhisa Kitano, Mitsubishi Electric and Hirohumi Nakano, Mitsubishi Electric
16.1 Page 277 Abstract
James Oerth, Skyworks Solutions, Stephen Cousineau, Skyworks Solutions and Sushila Singh, Skyworks Solutions
16.2 Page 281 Abstract
Junichiro Takeda, Hitachi Cable, Ltd., Ryota Isono, Hitachi Cable, Ltd., Shinjiro Fujio, Hitachi Cable, Ltd., Hiroyuki Kamogawa, Hitachi Cable, Ltd., Masae Sahara, Hitachi Cable, Ltd., Takeshi Meguro, Hitachi Cable, Ltd. and Yohei Otoki, Hitachi Cable, Ltd.
16.3 Page 285 Abstract
Helmut Jung, United Monolithic Semiconductors, Michael Hosch, University of Ulm, Reza Behtash, United Monolithic Semiconductors, James R. Thorpe, United Monolithic Semiconductors, Franck Bourgeois, United Monolithic Semiconductors, Stefanie Held, United Monolithic Semiconductors, Herve Blanck, United Monolithic Semiconductors, Andrei Sarua, University of Bristol, Nicole Killat, University of Bristol, Martin Kuball, University of Bristol and Thomas Roedle, NXP Semiconductors
16.4 Page 289 Abstract
E. R. Heller, Air Force Research Lab, K. Chabak, Air Force Research Lab, V. Miller, Air Force Research Lab, D. Walker, Jr., Air Force Research Lab, M. Trejo, Air Force Research Lab, M. Kossler, Air Force Research Lab, J. K. Gillespie, Air Force Research Lab, A. Crespo, Air Force Research Lab, R. Vetury, RF Micro Devices and G. D. Via, Air Force Research Lab
16.5 Page 295 Abstract
Arun Chawla, Skyworks Solutions, Mark Borek, Skyworks Solutions and Guoliang Zhou, Skyworks Solutions
17.1 Page 299 Abstract
Li-Han Hsu, National Chiao Tung University, Dan Kuylenstierna, Chalmers University of Technology, Herbert Zirath, Chalmers University of Technology, Edward Yi Chang, National Chiao Tung University and Chin-Te Wang, National Chiao Tung University
17.2 Page 303 Abstract
Sandeep Chaturvedi, Gallium Arsenide Enabling Technology Center, Sangam V. Bhalke, Gallium Arsenide Enabling Technology Center, Mahadeva K. Bhat, Solid State Research Lab - Timarpur, G. Sai Saravanan, Gallium Arsenide Enabling Technology Center, R. Muralidharan, Gallium Arsenide Enabling Technology Center and Shiban K. Koul, Indian Institute of Technology - Delhi
17.3 Page 307 Abstract
M. Faqir, University of Bristol, T. Batten, University of Bristol, T. Mrotzek, Plansee SE, S. Knippscheer, Plansee SE, L. Chalumeau, Egide, M. Massiot, Egide, M. Buchta, United Monolithic Semiconductors, James R. Thorpe, United Monolithic Semiconductors, Herve Blanck, United Monolithic Semiconductors, S. Rochette, Thales Alenia Space, O. Vendier, Thales Alenia Space and Martin Kuball, University of Bristol
17.4 Page 309 Abstract
David Kopp, University of Notre Dame, M. Ashraf Khan, University of Notre Dame, Scott Garvey, University of Notre Dame, Kristen Anderson, University of Notre Dame, Jason Kulick, University of Notre Dame, Alfred M. Kriman, University of Notre Dame, Gary H. Bernstein, University of Notre Dame and Patrick J. Fay, University of Notre Dame
17.5 Page 313 Abstract
Yasuki Aihara, Mitsubishi Electric, Toshiaki Kitano, Mitsubishi Electric, Kazuyo Endo, Mitsubishi Electric, Kenji Hosogi, Mitsubishi Electric and Hiroshi Fukumoto, Mitsubishi Electric
18.1 Page 319 Abstract
Dominik Schrade-Koehn, University of Ulm, Philipp Leber, University of Ulm, Reza Behtash, United Monolithic Semiconductors, Herve Blanck, United Monolithic Semiconductors and Hermann Schumacher, University of Ulm
18.2 Page 323 Abstract
G. Sai Saravanan, Gallium Arsenide Enabling Technology Center, Mahadeva K. Bhat, Solid State Research Lab - Timarpur, Sandeep Chaturvedi, Gallium Arsenide Enabling Technology Center, M. N. Mudholkar, Gallium Arsenide Enabling Technology Center and R. Muralidharan, Gallium Arsenide Enabling Technology Center
18.3 Page 327 Abstract
Andrew Choo, TriQuint Semiconductor and Thorsten Saeger, TriQuint Semiconductor
18.4 Page 333 Abstract
R. Schreiner, AIXTRON, A. Boyd, AIXTRON, O. Rockenfeller, AIXTRON, J. Kaeppeler, AIXTRON, B. Schineller, AIXTRON and M. Heuken, AIXTRON
18.5 Page 337 Abstract
M. J. Martinez, Sandia National Laboratory, F. H. Austin, LMATA, J. B. Clevenger, Sandia National Laboratory, A. J. Grine, Sandia National Laboratory, G. A. Patrizi, Sandia National Laboratory, K. Romero, LMATA, P. S. Vigil, LMATA, S. Wolfley, Sandia National Laboratory and C. T. Sullivan, Sandia National Laboratory
18.6 Page 341 Abstract
Nidhi, University of California, Santa Barbara, Sansaptak Dasgupta, University of California, Santa Barbara, David F. Brown, University of California, Santa Barbara, Stacia Keller, University of California, Santa Barbara, James S. Speck, University of California, Santa Barbara and Umesh K. Mishra, University of California, Santa Barbara
18.7 Page 345 Abstract
Peter Friedrichs, SiCED Electronics Development
18.8 Page 349 Abstract
Kuan-Hsuan Ho, WIN Semiconductor, Shih-Ming Lin, WIN Semiconductor, Huang-Wen Wang, WIN Semiconductor, Kevin Huang, WIN Semiconductor, Ping-Wei Chen, WIN Semiconductor and Chang-Hwang Hua, WIN Semiconductor
18.9 Page 353 Abstract
G. Sozzi, University of Parma, F. Troni, University of Parma and R. Menozzi, University of Parma
18.1 Page 357 Abstract
Elina Kashman, Engis Corp and Mark Irvin, Engis Corp