Optimization of a Metal Liftoff Process in a GaAs Semiconductor Device
Skyworks Solutions Inc., 20 Sylvan Rd., Woburn, MA 01801
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At Skyworks Solutions a defect was observed in a metal structure after a liftoff process had been performed. Investigation revealed the defect was due to damage caused by the liftoff process. The liftoff process was optimized for minimum defect level using DOE techniques. This paper will describe the defect and the investigations performed to understand it as well as a description of the DOE and the process modifications made based on its results.
Keywords: Liftoff, DOE, Ohmic, and NMP