FABRICATION AND
CHARACTERIZATION OF THIN FILM RESISTORS FOR GaAs-BASED POWER AMPLIFIERS
Hong Shen, Jose Arreaga,
Skyworks Solutions,
Inc.,
Email: hong.shen@skyworksinc.com Tel: (805) 480-4481
Keywords: TaN, NiCr, NiV, TFR, resistivity, GaAs
Abstract
This paper presents a
comprehensive study of sputtered TaN thin film resistor with a low resistivity
of only 150 µ.-cm, its comparison with thin film resistors fabricated by evaporated
NiCr and sputtered NiV. Sheet resistance (Rs), temperature coefficient of
resistance (TCR), and voltage coefficient of resistance (VCR) were measured
using a standard Van Der Pauw (VDP) structure. Thickness was measured by a
profilometer as well as cross-section SEM. Biased-drift tests and thermal tests
were performed to check the reliability of the thin film resistors.